Company Filing History:
Years Active: 1990
Title: Hitoshi Chawanya: Innovator in Film Formation Technology
Introduction
Hitoshi Chawanya is a prominent inventor based in Yokohama, Japan. He is known for his innovative contributions to the field of film formation processes. With a focus on high energy efficiency, his work has significant implications for various industrial applications.
Latest Patents
Hitoshi Chawanya holds a patent for a film formation process. This process involves bringing a substrate into contact with a plasma zone created by generating high temperature or quasi-high temperature plasma from a gas containing at least one carbon-containing compound. The method utilizes a sheet-like electrode with a slit connected to a microwave electric source or employs a magnetic field to move the plasma generated in an arc between electrodes by DC discharge. This innovative approach enables the efficient formation of films on substrate surfaces.
Career Highlights
Chawanya is associated with Japan Synthetic Rubber Co., Ltd., where he continues to develop and refine his technologies. His work has contributed to advancements in materials science and engineering, particularly in the area of film formation.
Collaborations
Hitoshi Chawanya has collaborated with notable colleagues, including Kenji Yanagihara and Mituo Kimura. These partnerships have fostered a collaborative environment that enhances innovation and research in their respective fields.
Conclusion
Hitoshi Chawanya's contributions to film formation technology exemplify the importance of innovation in industrial applications. His patent reflects a commitment to enhancing energy efficiency in manufacturing processes.