Company Filing History:
Years Active: 1985
Title: Hisashi Shimada: Innovator in Physical Vapor Deposition Technology
Introduction
Hisashi Shimada is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of physical vapor deposition technology. His innovative approach has led to the development of a unique apparatus that enhances surface treatment processes.
Latest Patents
Hisashi Shimada holds 1 patent for an "Apparatus for Physical Vapor Deposition." This apparatus features a vacuum casing with an open end, a sealing member at the opening, and an electrode for physical vapor deposition. It is designed to create a vacuum chamber that allows for the surface treatment of large or immovable bodies without the need for movement. The compact design and functionality of this apparatus make it a valuable asset in various industrial applications.
Career Highlights
Shimada is currently employed at Kabushiki Kaisha Toyota Chuo Kenkyusho, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of physical vapor deposition, contributing to the efficiency and effectiveness of surface treatment processes.
Collaborations
Hisashi Shimada has collaborated with notable colleagues, including Tohru Arai and Junji Endo. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Hisashi Shimada's contributions to the field of physical vapor deposition exemplify the impact of innovative thinking in technology. His work not only enhances industrial processes but also sets a foundation for future advancements in the field.