Hisashi Motobayashi

Title: Hisashi Motobayashi: Innovator in Photoresist Technology

Introduction

Hisashi Motobayashi is a prominent inventor based in Shizuoka, Japan. He is known for his significant contributions to the field of photoresist technology, particularly in the development of negative-working ultra thick film photoresist compositions. His innovative work has led to advancements in lithographic imaging processes.

Latest Patents

Hisashi Motobayashi holds 1 patent for his invention titled "Negative-working ultra thick film photoresist." This invention involves a photosensitive photoresist composition that is aqueous base developable. The composition includes a polymer with specific repeat units, a radical photo-initiator, a crosslinker, a radical inhibitor, and optional components such as surfactants and dissolution promoters. The process utilizing this negative resist is aimed at producing high-quality lithographic images.

Career Highlights

Motobayashi is currently associated with Merck Patent GmbH, where he continues to push the boundaries of innovation in photoresist technology. His work has been instrumental in enhancing the efficiency and effectiveness of lithographic processes used in various applications.

Collaborations

Throughout his career, Motobayashi has collaborated with notable colleagues, including Aritaka Hishida and Lei Lu. These collaborations have fostered a creative environment that has led to further advancements in their respective fields.

Conclusion

Hisashi Motobayashi's contributions to the field of photoresist technology exemplify the spirit of innovation. His work not only advances the technology but also sets a foundation for future developments in lithographic imaging.