Company Filing History:
Years Active: 2010-2015
Title: Hisamitu Hatou: Innovator in Shot Peening and X-ray Diffraction Technology
Introduction
Hisamitu Hatou is a notable inventor based in Hitachi, Japan, recognized for his contributions to the fields of shot peening and X-ray diffraction technology. With a total of four patents to his name, Hatou has made significant advancements that enhance the efficiency and safety of these processes.
Latest Patents
One of Hatou's latest patents is a method of executing shot peening. This innovative technique involves a chamber equipped with a water jet generation apparatus and a mesh that is pushed against the surface of a peening object. The rotary vane of the water jet generation apparatus generates a water jet that flows toward the peening object, allowing a plurality of shots to collide with its surface. This method effectively imparts compression residual stress to the surface, preventing the spread of contaminants. Another significant invention is an X-ray diffraction instrument that features a two-dimensional plate-like X-ray detector and an integrated X-ray emitter. This compact instrument allows for accurate X-ray diffraction measurements of larger stationary objects while ensuring operator safety by preventing X-ray leakage.
Career Highlights
Throughout his career, Hatou has worked with prominent companies such as Hitachi Nuclear Energy, Ltd. and Hitachi, Ltd. His experience in these organizations has contributed to his expertise in developing innovative technologies that address industry needs.
Collaborations
Some of Hatou's notable coworkers include Noboru Saitou and Ren Morinaka, who have collaborated with him on various projects, further enhancing the impact of his inventions.
Conclusion
Hisamitu Hatou's work in shot peening and X-ray diffraction technology exemplifies the spirit of innovation. His patents not only advance technical capabilities but also prioritize safety and efficiency in their applications.