Takasago, Japan

Hisako Yaura

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hisako Yaura - Innovator in Thiol Group-Including Compounds

Introduction

Hisako Yaura is a prominent inventor based in Takasago, Japan. She has made significant contributions to the field of chemistry, particularly in the development of methods for supporting thiol group-including compounds. Her innovative approach has garnered attention in the scientific community.

Latest Patents

Hisako Yaura holds a patent for a method titled "Method for Supporting Thiol Group-Including Compound." The objective of this invention is to provide an efficient method for supporting a thiol group-including compound on an insoluble base material. The method involves two key steps: Step A, which includes treating the thiol group-including compound with both a thiol group-including organic reducing agent and an inorganic reducing agent, and Step B, where the reaction liquid from Step A is contacted with the insoluble base material. This innovative method enhances the efficiency of supporting thiol compounds, which can have various applications in chemical processes.

Career Highlights

Yaura is associated with Kaneka Corporation, a leading company in the field of advanced materials and chemicals. Her work at Kaneka has allowed her to focus on innovative research and development, contributing to the company's reputation for excellence in the industry.

Collaborations

Throughout her career, Hisako Yaura has collaborated with talented individuals such as Takuma Suzuki and Dai Murata. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Hisako Yaura's contributions to the field of chemistry, particularly through her patented method for supporting thiol group-including compounds, highlight her innovative spirit and dedication to scientific advancement. Her work continues to influence the industry and inspire future innovations.

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