Osaka, Japan

Hisakazu Honma


Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2002-2006

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5 patents (USPTO):Explore Patents

Title: The Innovations of Hisakazu Honma in Electrophotosensitive Materials

Introduction

Hisakazu Honma is a notable inventor based in Osaka, Japan. With a total of five patents to his name, Honma has made significant contributions to the field of electrophotosensitive materials. His inventive work showcases a keen understanding of material science and engineering, particularly in enhancing the performance of light-sensitive materials used in various applications.

Latest Patents

Honma's latest patents focus on developing innovative electrophotosensitive materials that exhibit high sensitivity to digital light sources while maintaining exceptional charge stability under challenging conditions, such as high temperatures and exposure to NOx. One of his recent inventions provides a method for achieving uniform dispersion of phthalocyanines within a photosensitive layer, which is critical for ensuring optimal performance in imaging technologies. The electrophotosensitive material is produced by creating a photosensitive layer that incorporates phthalocyanine as an electric charge generating material, along with specific azo pigments and binder resins on a conductive substrate. The unique approach of using insoluble azo pigments lacking hydroxyl groups further enhances the properties of the material.

Additionally, his inventions include a novel titanyl phthalocyanine crystal, which is integral for preparing a coating solution with excellent storage stability. This innovation enables the production of electrophotosensitive materials that are both effective and reliable for various applications.

Career Highlights

Honma has dedicated a significant portion of his career to advancing the field of photochemistry and material engineering while working at Kyocera Mita Corporation. His expertise and innovative approach have led to breakthroughs in the development of materials that are essential for modern imaging technologies. The impact of his work is reflected in the patents he holds, showcasing not only his technical capabilities but also his commitment to pushing the boundaries of what is possible in his field.

Collaborations

Throughout his career, Honma has collaborated with talented colleagues like Jun Azuma and Yukimasa Watanabe, who also contribute to the innovative research and development efforts within the company. These collaborations not only emphasize the importance of teamwork in scientific advancement but also highlight the diverse expertise that drives the development of new technologies.

Conclusion

Hisakazu Honma's work exemplifies the spirit of innovation in the field of electrophotosensitive materials. His patents illustrate a significant understanding of the complexities involved in material science, revealing his profound impact on modern imaging technologies. As advancements continue, Honma's contributions will undoubtedly influence the future of electrophotography and related fields.

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