Osaka, Japan

Hiroyasu Ishii


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

Loading Chart...
1 patent (USPTO):Explore Patents

Title: **Hiroyasu Ishii: Innovator in Gas Separation Technology**

Introduction

Hiroyasu Ishii is a distinguished inventor based in Osaka, Japan. He has made significant contributions to the field of gas separation technology. With a notable patent to his name, Ishii has established himself as an inventive force in advancing materials science.

Latest Patents

Ishii holds a patent for a CHA-type titanosilicate separation membrane and its production method. This innovative membrane is designed for separating mixed gases, particularly those containing smaller molecules. Its high durability in high-temperature environments, combined with an impressive permeation rate and selectivity for gases such as water vapor, makes it a remarkable achievement in the field. The membrane is structured with a CHA-type titanosilicate crystal framework that excludes aluminum from its backbone, utilizing silicon, oxygen, and titanium in its composition.

Career Highlights

Throughout his career, Hiroyasu Ishii has worked with prominent organizations, including Hitachi Zosen Corporation and the School Corporation Kansai University. His roles in these institutions have contributed to the development and refinement of innovative technologies in engineering and materials science.

Collaborations

Ishii has collaborated with notable colleagues, such as Satoshi Imasaka and Sadao Araki. Their teamwork has been essential in driving forward research and development in the gas separation field, showcasing the importance of collaboration in achieving groundbreaking innovations.

Conclusion

Hiroyasu Ishii’s contributions to technology exemplify the impact of inventors in addressing complex challenges through innovation. His patent on the CHA-type titanosilicate separation membrane underscores the potential for advancements in gas separation technologies, paving the way for future research and applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…