Company Filing History:
Years Active: 1996-1998
Title: Hiroya Nakagawa: Innovator in Photoresist Technology
Introduction
Hiroya Nakagawa is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 3 patents. His work focuses on developing advanced materials that enhance the performance of photoresist compositions.
Latest Patents
Among his latest patents is a photoresist composition comprising a polyfunctional vinyl ether compound. This innovative composition includes a polyfunctional vinyl ether compound and a photoresist resin composition. The compound is represented by a specific formula, where the average repeating number, denoted as n, ranges from 0 to 20. The components R1 and R2 can be various groups, including hydrogen, halogen, alkyl, aryl, aralkyl, alkoxy, aryloxy, or cycloalkyl groups. Additionally, Q can represent either an --OH group or a specific alkylene group, with a defined molar ratio. This invention aims to improve the efficiency and effectiveness of photoresist applications in various industries.
Career Highlights
Hiroya Nakagawa is currently employed at Sumitomo Chemical Company, Limited, where he continues to innovate and develop new technologies. His expertise in photoresist materials has positioned him as a key figure in the field, contributing to advancements that benefit the semiconductor and electronics industries.
Collaborations
Hiroya has collaborated with notable colleagues, including Shigeo Hozumi and Shinichiro Kitayama. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Hiroya Nakagawa's contributions to photoresist technology exemplify the impact of innovation in the field. His patents and collaborations highlight his commitment to advancing materials that play a crucial role in modern technology.