Funabashi, Japan

Hirotada Iida


Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Funabashi, JP (1993 - 1996)
  • Tokyo, JP (2000)
  • Nakano-Ku, JP (2001)
  • Ichikawa, JP (2004)

Company Filing History:


Years Active: 1993-2004

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7 patents (USPTO):Explore Patents

Title: Hirotada Iida: Innovator in Photosensitive Agents

Introduction

Hirotada Iida is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of photosensitive agents, holding a total of seven patents. His work has advanced the production methods and applications of these compounds, which are essential in various technological processes.

Latest Patents

Iida's latest patents include innovative methods for producing photosensitive agents. One of his notable inventions is the 1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, along with a method for producing this agent. Additionally, he developed a photoresist composition and an effective method for producing 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride at high yield. This method prevents the formation of impurities by reacting 1,2-naphthoquinone-2-diazide with chlorosulfuric acid, followed by the addition of thionyl chloride or phosphorus pentachloride for further reaction.

Career Highlights

Throughout his career, Hirotada Iida has worked with prominent companies such as Toyo Gosei Kogyo Co., Ltd. and Toyo Gosei Kogy Co., Ltd. His experience in these organizations has allowed him to refine his expertise in the development of photosensitive materials.

Collaborations

Iida has collaborated with several professionals in his field, including Katsuyo Tokuda and Kieko Harada. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Hirotada Iida's contributions to the field of photosensitive agents demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving production methods and enhancing the quality of photosensitive materials.

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