Sagamihara, Japan

Hiroshi Watanabe


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Hiroshi Watanabe: Innovator in Bonded Magnet Technology

Introduction

Hiroshi Watanabe is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of magnet technology, particularly through his innovative methods of enhancing bonded magnets. His work focuses on improving the durability and performance of these magnets, which are essential in various applications.

Latest Patents

Hiroshi Watanabe holds a patent for a method of plating a bonded magnet and a bonded magnet carrying a metal. This patent describes a process for forming a closely adherent metal coating that is uniform in thickness and free from pinholes. The coating enhances the oxidation and corrosion resistance of the bonded magnet without compromising its magnetic properties. The electroplating process utilizes an aqueous solution that is chlorine-free and has a pH of 5 or above. The solution primarily consists of nickel sulfate, an organic acid salt electrolyte, and a basic electrolyte, all of which contribute to forming a nickel coating on the magnet's surface.

Career Highlights

Hiroshi Watanabe has dedicated his career to advancing magnet technology. His innovative approaches have led to improved manufacturing processes and enhanced product performance. His work is recognized within the industry for its practical applications and contributions to the field.

Collaborations

Hiroshi collaborates with Takuji Nomura, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of magnet technology and explore new possibilities for its applications.

Conclusion

Hiroshi Watanabe's contributions to bonded magnet technology exemplify the impact of innovation in engineering. His patented methods not only improve the performance of magnets but also pave the way for future advancements in the field.

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