Kawasaki, Japan

Hiroshi Urabe


Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 1987-1990

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6 patents (USPTO):Explore Patents

Title: Hiroshi Urabe: Innovator in Electrophotography and Copolyamide Technology

Introduction

Hiroshi Urabe is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the fields of electrophotography and materials science. With a total of 6 patents to his name, Urabe's work has had a lasting impact on various industries.

Latest Patents

One of Urabe's latest patents is a photosensitive member for electrophotography. This invention comprises a photosensitive layer on a conductive substrate, utilizing a modified polycarbonate resin as a binder. The photosensitive member is designed to be highly resistant to mechanical wear and deterioration of sensitivity and chargeability. Another notable patent is a transparent copolyamide derived from bis(3-methyl-4-amino-cyclohexyl)methane. This copolyamide includes constitutional units from both hexamethylenediamine and a combination of isophthalic and terephthalic acids, showcasing Urabe's innovative approach to material development.

Career Highlights

Throughout his career, Hiroshi Urabe has worked with leading companies in the chemical industry. He has been associated with Mitsubishi Chemical Industries Limited and Mitsubishi Kasei Corporation, where he contributed to various research and development projects. His expertise in materials science has positioned him as a key figure in his field.

Collaborations

Urabe has collaborated with notable colleagues, including Masahiro Nukui and Masayoshi Hasuo. These partnerships have fostered innovation and have led to advancements in their respective areas of expertise.

Conclusion

Hiroshi Urabe's contributions to technology and materials science are noteworthy. His patents reflect a commitment to innovation and excellence in his field. As an inventor, he continues to inspire future generations of researchers and developers.

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