Hiroshi Tsunematsu

Title: Hiroshi Tsunematsu: Innovator in Sputter Technology

Introduction

Hiroshi Tsunematsu is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of sputter technology, particularly through his innovative patent related to sputter apparatus and film formation methods. His work has implications for various applications in material science and engineering.

Latest Patents

Hiroshi Tsunematsu holds a patent for a sputter apparatus, control device for sputter apparatus, and film formation method. This patent describes a process where a substrate holder is rotated at a fixed speed while plasma is generated. The invention outlines a method for managing the deposition of materials on a substrate, detailing the transition between different operational states to optimize the deposition process.

Career Highlights

Hiroshi Tsunematsu is currently employed at Canon Anelva Corporation, where he continues to develop and refine technologies related to sputtering and thin film deposition. His expertise in this area has positioned him as a valuable asset to his company and the broader field of semiconductor manufacturing.

Collaborations

Hiroshi has collaborated with fellow inventor Yoshinori Nagamine, contributing to advancements in their shared field of expertise. Their partnership has fostered innovation and development in sputter technology.

Conclusion

Hiroshi Tsunematsu's contributions to sputter technology through his patent and work at Canon Anelva Corporation highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of material deposition techniques.