Hiroshi Miyabayashi

Title: **Hiroshi Miyabayashi: Innovator in Substrate Technology**

Introduction

Hiroshi Miyabayashi, a notable inventor based in Kanagawa, Japan, has made significant contributions to semiconductor technology with a total of two patents to his name. His innovative work focuses primarily on manufacturing methods and processes related to silicon-on-insulator (SOI) substrates, which are critical components in modern electronic devices.

Latest Patents

Miyabayashi's latest patents include a **substrate manufacturing method** and a **substrate processing apparatus**. The manufacturing method involves preparing an SOI substrate with a thick SOI layer and then systematically thinning it to a target film thickness. This intricate process capitalizes on a unit thinning step that consists of an oxidation phase—where the surface of the SOI layer is oxidized—and a selective removal stage that eliminates the silicon oxide created during oxidation. Additionally, the SOI layer undergoes chemical etching, where a chemical solution is applied to measure and adjust the film thickness precisely. The process concludes once the thickness of the SOI layer attains a predetermined value.

Furthermore, his **semiconductor-on-insulator annealing method** aims to minimize defects in the SOI layer. This method involves annealing the SOI substrate in a reducing atmosphere, maintaining a temperature that does not exceed the melting point of the semiconductor. Specifically, the technique employs a flow of reducing atmospheric gas directed parallel to the substrate's surface, enhancing the quality of the SOI layer.

Career Highlights

Hiroshi Miyabayashi is currently affiliated with Canon Kabushiki Kaisha, where his pioneering work in SOI technology continues to advance the capabilities of semiconductors. His innovative approaches have not only contributed to the field but have also positioned Canon as a leader in semiconductor manufacturing.

Collaborations

Over the years, Miyabayashi has collaborated with fellow innovators, including Masataka Ito and Kenji Yamagata. These partnerships have enabled cross-pollination of ideas and techniques, further enriching the development of advanced semiconductor technologies.

Conclusion

Hiroshi Miyabayashi exemplifies the innovative spirit necessary for advancement in the semiconductor industry. His contributions to substrate technology through his patented methods underscore the importance of continuous research and development. As the demand for high-performance electronic devices grows, inventors like Miyabayashi will be pivotal in shaping the future landscape of technology.