Hiroshi Miki

Title: Hiroshi Miki: Innovator in Sputtering Technology

Introduction

Hiroshi Miki is a notable inventor based in Tama, Japan. He has made significant contributions to the field of sputtering technology, particularly in the development of advanced apparatuses and control methods. With a total of 2 patents, Miki's work has had a substantial impact on the manufacturing processes in various industries.

Latest Patents

Miki's latest patents include the "Double-layer shutter sputtering apparatus" and the "Double-layer shutter control method of multi-sputtering system." The first patent describes a sputtering apparatus that features a target holder for at least two targets and a substrate holder. It includes a first shutter plate and a second shutter plate, both capable of rotating to create simultaneous paths for co-sputtering, allowing for efficient film formation on substrates. The second patent outlines a control method for a multi-sputtering system that utilizes a double-layer rotating shutter mechanism. This method enables the selection of targets while preventing cross-contamination, ensuring high-quality film deposition.

Career Highlights

Hiroshi Miki is currently employed at Canon Anelva Corporation, where he continues to innovate in the field of sputtering technology. His work has been instrumental in enhancing the efficiency and effectiveness of sputtering processes, which are critical in various applications, including semiconductor manufacturing.

Collaborations

Miki has collaborated with notable colleagues such as Shuji Nomura and Ayumu Miyoshi. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in sputtering.

Conclusion

Hiroshi Miki's contributions to sputtering technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.