Company Filing History:
Years Active: 1991
Title: Hiroshi Hidaka: Innovator in Semiconductor Processing
Introduction
Hiroshi Hidaka is a prominent inventor based in Ibaraki, Japan. He is known for his significant contributions to the field of semiconductor processing. His innovative methods have paved the way for advancements in the technology sector.
Latest Patents
Hidaka holds a patent for a method capable of forming a fine pattern without crystal defects. This method involves processing a compound semiconductor wafer to deposit or form a specific layer on the wafer surface. The process includes partially removing the specific layer to expose the wafer surface and etching the exposed area using an electron beam and specific gases such as chlorine, bromine, or iodine. The specific layer can be formed as an oxide layer by spraying oxygen gas onto the wafer surface while irradiating it with light. This innovative approach allows for the creation of either an adsorbed molecular layer or a chemically reacted layer. The method can also utilize different gases for the removal and etching processes, all while maintaining an airtight environment.
Career Highlights
Hiroshi Hidaka is associated with the Optoelectronics Technology Research Corporation, where he continues to develop cutting-edge technologies. His work has been instrumental in enhancing the efficiency and precision of semiconductor manufacturing processes.
Collaborations
Hidaka has collaborated with notable colleagues, including Akita Kenzo and Mototaka Taneya. Their combined expertise has contributed to the advancement of innovative solutions in the field.
Conclusion
Hiroshi Hidaka's contributions to semiconductor processing exemplify the spirit of innovation. His patented methods are a testament to his dedication to advancing technology in the industry.