Hiromitsu Yanaka

Title: Hiromitsu Yanaka: Innovator in Photosensitive Materials

Introduction

Hiromitsu Yanaka is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 11 patents. His work has advanced the technology used in planographic printing and recording materials.

Latest Patents

Yanaka's latest patents include innovations such as a photosensitive recording material and a planographic printing plate precursor. The photosensitive recording material features a support with a photosensitive layer and a protective layer. The photosensitive layer contains a polymerization initiator, a sensitizing agent, and a polymerizable compound. The protective layer is designed with a water-insoluble and alkali-soluble dye, which has an absorption wavelength region distinct from that of the sensitizing agent. Additionally, the planographic printing plate precursor includes a support, a photosensitive layer with a polymerizable compound, an oxygen barrier layer, and a protective layer containing a filler. These layers are meticulously arranged to enhance the functionality of the printing plates.

Career Highlights

Throughout his career, Yanaka has worked with notable companies such as Fuji Photo Film Company, Limited and Fujifilm Corporation. His experience in these organizations has allowed him to refine his expertise in the development of innovative materials.

Collaborations

Yanaka has collaborated with esteemed colleagues, including Kazuo Maemoto and Shigeo Koizumi. Their joint efforts have contributed to the advancement of technology in their respective fields.

Conclusion

Hiromitsu Yanaka's contributions to the field of photosensitive materials and planographic printing are noteworthy. His innovative patents and collaborations reflect his dedication to advancing technology in this area.