Kyoto, Japan

Hiromi Murachi


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2021

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3 patents (USPTO):Explore Patents

Title: Hiromi Murachi: Innovator in Substrate Processing Technologies

Introduction

Hiromi Murachi is a prominent inventor based in Kyoto, Japan. She has made significant contributions to the field of substrate processing, particularly through her innovative patents. With a total of 3 patents to her name, Murachi's work focuses on enhancing the efficiency and effectiveness of substrate cleaning and processing methods.

Latest Patents

Murachi's latest patents include a substrate cleaning device, a substrate processing apparatus, and a substrate cleaning method. The substrate cleaning device features a polishing head that contacts one surface of a substrate rotated by a spin chuck. The polishing head is designed to move between the center and the outer periphery of the substrate, allowing for effective polishing and removal of contaminants. The capacity for removing contaminants can be adjusted based on the position in the radial direction of the substrate, which enhances the cleaning process.

Additionally, her substrate processing apparatus employs a cleaning brush alongside the polishing head. This system creates overlapping trajectories for both components, defining an interference region. The cleaning brush activates once the polishing head exits this region, ensuring thorough cleaning of the substrate.

Career Highlights

Murachi is currently employed at Screen Holdings Co., Ltd., where she continues to develop innovative solutions in substrate processing. Her work has been instrumental in advancing technologies that improve the quality and efficiency of substrate cleaning.

Collaborations

Some of her notable coworkers include Ryuichi Yoshida and Koji Nishiyama, who collaborate with her on various projects within the company.

Conclusion

Hiromi Murachi's contributions to substrate processing technologies exemplify her innovative spirit and dedication to improving industrial processes. Her patents reflect a deep understanding of the challenges in substrate cleaning and processing, making her a valuable asset in her field.

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