Company Filing History:
Years Active: 1992-1998
Title: Hiromi Matsumura - Innovator in Cu-Ga Alloy Sputtering Technology.
Introduction
Hiromi Matsumura is an inventor based in Hyogo, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. His innovative work focuses on enhancing the uniformity and strength of sputtered films.
Latest Patent Applications
Matsumura's notable patent application is for a Cu-Ga alloy sputtering target and its manufacturing method. This application discloses a Cu-Ga alloy sputtering target that enables the formation of a Cu-Ga sputtering film with excellent uniformity in film component composition. It also reduces the occurrence of arcing during sputtering, possesses high strength, and rarely undergoes cracking during the sputtering process. The Cu-Ga alloy sputtering target comprises a Cu-based alloy containing Ga, with an average crystal particle diameter of 10 μm or less and a porosity of 0.1% or less.
Conclusion
Hiromi Matsumura's work in developing advanced sputtering targets showcases his commitment to innovation in materials science. His contributions are poised to impact the efficiency and quality of sputtered films in various applications.