Hino, Japan

Hiroko Ennyu


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Hiroko Ennyu: Innovator in Photosensitive Material Processing

Introduction

Hiroko Ennyu is a prominent inventor based in Hino, Japan. She has made significant contributions to the field of photosensitive materials, particularly through her innovative patent. With a focus on enhancing processing techniques, her work has implications for various applications in imaging technologies.

Latest Patents

Hiroko Ennyu holds a patent for an "Apparatus for processing a silver halide photosensitive material." This invention features a unique design that includes a first processor with a retaining member for solution storage, a second processor positioned beneath it, and a conveyor system that efficiently moves the photosensitive material between the two processors. This innovative approach allows for improved processing efficiency and quality.

Career Highlights

Ennyu has dedicated her career to advancing technologies related to photosensitive materials. Her work at Konica Corporation has positioned her as a key player in the development of imaging solutions. With her expertise, she has contributed to the evolution of processing techniques that are essential in the photography and imaging industries.

Collaborations

Hiroko has collaborated with notable colleagues, including Masayuki Kurematsu and Nobuya Yamamoto. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hiroko Ennyu's contributions to the field of photosensitive materials exemplify her dedication to innovation. Her patent and collaborative efforts highlight her role as a leading inventor in this specialized area.

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