Company Filing History:
Years Active: 2025
Title: Hiroki Sawaki: Innovator in Water-Absorbent Resin Technology
Introduction
Hiroki Sawaki is a notable inventor based in Himeji, Japan. He has made significant contributions to the field of water-absorbent resin technology. With a total of 2 patents, his work has garnered attention for its innovative approaches to producing water-absorbent materials.
Latest Patents
Hiroki Sawaki's latest patents include a method for producing water-absorbent resin particles. The first embodiment of this method involves a polymerization step where a monomer is polymerized on at least a part of the surface of a surface-crosslinked polymer particle. This process results in the formation of a new polymer. The second embodiment also focuses on producing water-absorbent resin particles, where a monomer is polymerized on a non-surface-crosslinked polymer particle in the presence of a crosslinking agent. This innovative approach enhances the properties of the resulting resin particles. Additionally, his patents describe water-absorbent resin particles that exhibit a contact angle of 100 degrees or larger when tested with 0.9% by mass saline at 25° C.±2° C. These advancements contribute to the development of effective absorbent materials.
Career Highlights
Hiroki Sawaki is currently employed at Sumitomo Seika Chemicals Co., Ltd., where he continues to innovate in the field of chemical engineering. His work focuses on enhancing the performance and efficiency of water-absorbent materials, which have various applications in industries such as agriculture and hygiene products.
Collaborations
Hiroki collaborates with talented coworkers, including Tetsuhiro Kobayashi and Tomoka Yamamoto. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Hiroki Sawaki's contributions to water-absorbent resin technology highlight his role as a key inventor in this field. His innovative methods and collaborative efforts continue to advance the industry, making significant impacts on various applications.