Hiroki Matsuda

Title: Hiroki Matsuda: Innovator in Silicon Nitride Deposition

Introduction

Hiroki Matsuda is a notable inventor based in Tama, Japan. He has made significant contributions to the field of materials science, particularly in the area of semiconductor manufacturing. His innovative approach to selective deposition techniques has garnered attention in the industry.

Latest Patents

Matsuda holds a patent titled "Method for selective deposition of silicon nitride and structure including selectively-deposited silicon nitride layer." This patent describes a method for selectively depositing silicon nitride on a first material relative to a second material. The exemplary method includes performing one or more deposition cycles and executing a treatment process. This innovation is crucial for enhancing the efficiency and effectiveness of semiconductor devices.

Career Highlights

Hiroki Matsuda is currently associated with ASML Holding B.V., a leading company in the semiconductor industry. His work focuses on advancing deposition techniques that are essential for the production of high-performance electronic components. His expertise in this area has positioned him as a valuable asset to his organization.

Collaborations

Matsuda collaborates with various professionals in the field, including his coworker Agung Setiadi. Together, they work on projects that aim to push the boundaries of current technologies in semiconductor manufacturing.

Conclusion

Hiroki Matsuda's contributions to the field of selective deposition of silicon nitride highlight his innovative spirit and dedication to advancing technology. His work continues to influence the semiconductor industry, paving the way for future advancements.