Vale of Glamorgan, United Kingdom

Hilke Donohue


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Hilke Donohue

Introduction: Hilke Donohue is a remarkable inventor based in the Vale of Glamorgan, GB. With a unique perspective in the field of material sciences, she has made significant contributions to technology through her innovative patent. As a dedicated professional at Trikon Technologies Limited, Hilke is paving the way for advancements in barrier layer deposition methods.

Latest Patents: Hilke holds a patent titled "Barrier layer and method of depositing a barrier layer." This invention details a process in which a barrier layer is deposited on a substrate that has a recess by sputtering tantalum in a nitrogen atmosphere. The method emphasizes a specific flow of nitrogen to achieve the deposition of mixed phase bcc/β-Ta, while the sputter ions are sufficiently energetic to facilitate the re-sputtering of deposited materials from the base of the recess to its sidewalls.

Career Highlights: With one patent to her name, Hilke's work at Trikon Technologies Limited showcases her commitment to innovation and engineering excellence. Her contributions are pivotal in developing effective and efficient methods for barrier layer applications, which are essential in various technological domains.

Collaborations: Hilke collaborates with Stephen Robert Burgess, who is both a colleague and a contributor to their shared vision of advancing materials science. This partnership exemplifies the power of teamwork in driving innovation and achieving breakthroughs in research and development.

Conclusion: Hilke Donohue stands out as an inspiring inventor in the field of barrier layer technology. Her innovative approach and commitment to research continue to influence the industry positively. As she progresses in her career, the advancements resulting from her work are sure to impact various applications, reinforcing the importance of female inventors in shaping the future of technology.

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