Kerkrade, Netherlands

Hildegard Siekmann



Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2013

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hildegard Siekmann: Innovator in Transparent Conductive Oxide Technology

Introduction

Hildegard Siekmann is a notable inventor based in Kerkrade, Netherlands. She has made significant contributions to the field of materials science, particularly in the development of processes for treating substrates with transparent conductive oxide layers. Her innovative work has led to the filing of a patent that showcases her expertise and dedication to advancing technology.

Latest Patents

Hildegard Siekmann holds a patent for a "Process and device for cleaning and etching a substrate with a transparent conductive oxide layer." This patent describes a simple yet effective process for treating substrates that have pre-structured zinc oxide layers on both rigid and flexible supports. The process involves treating the zinc oxide with an etching medium followed by a cleaning liquid. This treatment is performed while the substrate is conveyed through a specialized device. The method is technically straightforward and allows for the regular and homogeneous roughening and texturizing of zinc oxide layers up to 1 meter in size.

Career Highlights

Hildegard Siekmann is associated with Forschungszentrum Jülich GmbH, where she has been instrumental in research and development projects. Her work focuses on enhancing the efficiency and effectiveness of transparent conductive oxide applications, which are crucial in various electronic and optoelectronic devices.

Collaborations

Throughout her career, Hildegard has collaborated with esteemed colleagues such as Joachim Müller and Gunnar Schöpe. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hildegard Siekmann's contributions to the field of transparent conductive oxides exemplify her commitment to innovation and technology. Her patent reflects her ability to simplify complex processes, making significant strides in materials science.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…