Kyoto, Japan

Hideyuki Fujiwara


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations by Hideyuki Fujiwara: Pioneering Ion Source Technology

Introduction

Hideyuki Fujiwara, an esteemed inventor based in Kyoto, Japan, has made significant contributions to the field of ion technology. With one notable patent under his name, Fujiwara's work focuses on improving ion implantation methods that are critical for various applications in semiconductor manufacturing.

Latest Patents

Fujiwara's most recent patent involves an innovative ion source, ion implantation apparatus, and ion implantation method. This invention features a ribbon-like ion beam, characterized by its larger dimension in the Y direction compared to the X direction. The design includes a plasma generating vessel with an ion extraction port that extends in the Y direction. It incorporates multiple stages of cathodes arranged along the Y direction within the vessel, a reflecting electrode positioned opposite the cathodes, and electromagnets that create magnetic fields along the X direction, facilitating the ion extraction process.

Career Highlights

Hideyuki Fujiwara is associated with Nissin Ion Equipment Co., Ltd., a company known for its expertise in ion implantation technology. His role there has allowed him to push the boundaries of current technological standards in the semiconductor industry through innovative solutions and relentless research.

Collaborations

Within Nissin Ion Equipment Co., Ltd., Fujiwara has collaborated with talented colleagues such as Takatoshi Yamashita and Tadashi Ikejiri. Together, they work towards advancing ion technology, ensuring that their innovations can keep pace with the rapid developments in the semiconductor sector.

Conclusion

With his remarkable patent and contributions to ion technology, Hideyuki Fujiwara stands out as a key inventor in the field. His work not only enhances ion implantation methods but also plays a vital role in shaping the future of semiconductor manufacturing, proving that innovation and collaboration go hand in hand for technological advancement.

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