Hideo Noda

Title: Hideo Noda: Innovator in Semiconductor Manufacturing

Introduction

Hideo Noda is a prominent inventor known for his contributions to the field of semiconductor manufacturing. He is based in Oume, Japan, and has made significant advancements in the technology that underpins modern electronics. His innovative methods have paved the way for improved semiconductor devices.

Latest Patents

Hideo Noda holds a patent for a method of manufacturing semiconductor devices with local oxidation. This improved method employs a local oxidation process where an oxide isolation region is formed by locally oxidizing a silicon epitaxial layer. The process utilizes a nitride-oxide double layer for masking purposes. A P.sup.+ type region is formed by the diffusion of an impurity into the silicon epitaxial layer, using the oxide isolation region, which features an 'oxide beak', as a diffusion mask. This method effectively eliminates disadvantages caused by the oxide beak, such as imperfect protection of the PN junction and potential short-circuiting.

Career Highlights

Hideo Noda has had a successful career at Hitachi, Ltd., where he has contributed to various projects and innovations in semiconductor technology. His work has been instrumental in enhancing the efficiency and reliability of semiconductor devices.

Collaborations

Throughout his career, Hideo Noda has collaborated with notable colleagues, including Akio Hayasaka and Michio Suzuki. These collaborations have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Hideo Noda's innovative methods in semiconductor manufacturing have made a lasting impact on the industry. His patent reflects a deep understanding of the complexities involved in semiconductor technology. His contributions continue to influence the development of modern electronic devices.