Kodaira, Japan

Hideo Iwasawa


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1976

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1 patent (USPTO):Explore Patents

Title: Hideo Iwasawa: Innovator in Semiconductor Technology

Introduction

Hideo Iwasawa is a notable inventor based in Kodaira, Japan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique semiconductor device that enhances performance and durability.

Latest Patents

Hideo Iwasawa holds a patent for a semiconductor device. This device features a surface covered with a silicone varnish, where the side chain radical ratio between methyl radicals and phenyl radicals is 20:1 or greater. This design effectively shields the semiconductor element from external moisture, improving its reliability and longevity.

Career Highlights

Iwasawa is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced semiconductor solutions that meet the demands of modern electronics.

Collaborations

Throughout his career, Hideo Iwasawa has collaborated with esteemed colleagues, including Yoshiaki Wakashima and Hideo Inayoshi. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hideo Iwasawa's contributions to semiconductor technology exemplify the spirit of innovation. His patented device showcases his commitment to enhancing the performance of electronic components. His work continues to influence the industry and inspire future advancements.

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