Hideki Ohno

Title: The Innovations of Hideki Ohno

Introduction

Hideki Ohno is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on protective measures for photomasks and reticles used in the manufacturing of integrated circuits.

Latest Patents

Ohno holds a patent for a "Protective dust cover for photomask or reticle." This invention is a transparent thin film cover designed to be positioned at a certain distance from the substrate surface of the photomask or reticle. It serves to protect the substrate surface from dust and other contaminants. The film consists mainly of a polyvinyl acetal, which has specific chemical properties that enhance its effectiveness in semiconductor applications. He has 1 patent to his name.

Career Highlights

Ohno is currently employed at Tosoh Corporation, where he continues to innovate in the semiconductor field. His expertise and dedication have made him a valuable asset to the company. His work has contributed to advancements in the production of integrated circuits, which are essential for modern electronics.

Collaborations

Ohno has collaborated with notable colleagues such as Noriaki Oshima and Masaki Uchikura. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Hideki Ohno's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to impact the industry positively, ensuring the ongoing development of efficient and effective semiconductor manufacturing processes.