Chiba, Japan

Hidefumi Tanaka

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 20(Granted Patents)


Location History:

  • Ichihara, JP (2022)
  • Chiba, JP (2007 - 2024)

Company Filing History:


Years Active: 2007-2025

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7 patents (USPTO):Explore Patents

Title: Innovations of Hidefumi Tanaka

Introduction

Hidefumi Tanaka is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of silicone compositions, particularly in the development of release agents. With a total of seven patents to his name, Tanaka's work has had a considerable impact on various industries.

Latest Patents

Tanaka's latest patents include a curable silicone composition designed for use as a release agent. This composition allows for the release of a release film from a silicone adhesive with low release force, while maintaining the adhesive strength of the silicone adhesive to other substrates. The composition consists of a mixture of fluoroalkyl group-containing organopolysiloxanes, an organopolysiloxane with silicon-bonded hydrogen atoms, a hydrosilylation reaction catalyst, and an organic solvent. Additionally, he has developed a release film and laminate that exhibit a small release force, even when thin, without compromising adhesive strength.

Career Highlights

Throughout his career, Tanaka has worked with prominent companies such as Dow Toray Co., Ltd. and Dow Corning Toray Company, Ltd. His experience in these organizations has allowed him to refine his expertise in silicone technology and contribute to innovative solutions in the field.

Collaborations

Tanaka has collaborated with notable coworkers, including Michitaka Suto and Satoshi Onodera. These partnerships have fostered a collaborative environment that has led to advancements in silicone compositions and their applications.

Conclusion

Hidefumi Tanaka's contributions to the field of silicone compositions and release agents highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in his work.

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