Company Filing History:
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Years Active: 1990-1998
Title: The Innovative Contributions of Henry S. Hu
Introduction
Henry S. Hu is a notable inventor based in Derwood, MD (US). He has made significant contributions to the field of materials science, particularly in the development of low dielectric constant materials. With a total of four patents to his name, Hu's work has implications for various applications, including electronics and circuit board manufacturing.
Latest Patents
Among his latest patents, Hu has developed a reaction product known as low dielectric constant allylics. This product is a result of a liquid monomeric allyletherfluoroalkylene benzene and a liquid polymethylhydrosiloxane. In its cured, solid state, this reaction product exhibits a dielectric constant below about 2.5. Another significant patent involves fluorinated resins with low dielectric constant. In this innovation, a highly fluorinated benzene compound is reacted with acryloyl chloride to yield a fluorinated liquid product. This product is used to impregnate a reinforcing structure, which is then polymerized at approximately 55 degrees Celsius to create a reinforced polymeric structure, such as a circuit board. The resulting polymer has a dielectric constant of about 2.1, which is considerably lower than that of currently used polymers.
Career Highlights
Throughout his career, Henry S. Hu has worked with esteemed organizations, including the United States as represented by the Secretary of the Navy and The Johns Hopkins University. His work in these institutions has allowed him to push the boundaries of material science and contribute to advancements in technology.
Collaborations
Hu has collaborated with notable colleagues, including James R. Griffith and Richard S. Potember. These partnerships have fostered an environment of innovation and have led to the successful development of his patented technologies.
Conclusion
Henry S. Hu's contributions to the field of materials science, particularly through his innovative patents, have made a lasting impact on the industry. His work continues to influence the development of advanced materials with low dielectric constants, paving the way for future technological advancements.