Company Filing History:
Years Active: 2000
Title: Helmut Haberhauer: Innovator in Radiation-Sensitive Materials
Introduction
Helmut Haberhauer is a notable inventor based in Taunusstein, Germany. He has made significant contributions to the field of radiation-sensitive materials, holding two patents that showcase his innovative spirit and technical expertise.
Latest Patents
Haberhauer's latest patents include a thermally recordable material that is insensitive to white light. This invention features a substrate and a radiation-sensitive, water-insoluble layer containing a component that absorbs infrared (IR) radiation. After exposure to IR radiation, the material becomes soluble or swellable in an aqueous alkaline developer. Additionally, a top layer that is opaque to white light but transparent to IR radiation can be removed with water or an aqueous solution, making the recording material substantially insensitive to daylight. Another patent involves a radiation-sensitive mixture that includes a carbon black pigment with a primary particle size smaller than 80 nm, which is predispersed in a polymer containing acidic units. This mixture allows for the development of the recording material in an aqueous alkaline solution without leaving residual coating.
Career Highlights
Haberhauer is associated with Agfa Gevaert NV, a company known for its advancements in imaging technology. His work has significantly impacted the development of materials used in offset printing and other applications.
Collaborations
Haberhauer has collaborated with notable colleagues such as Andreas Elsaesser and Fritz-Feo Grabley, contributing to the advancement of their shared field.
Conclusion
Helmut Haberhauer's innovative work in radiation-sensitive materials has led to significant advancements in the industry. His patents reflect a deep understanding of material science and a commitment to developing technologies that enhance printing processes.