Company Filing History:
Years Active: 1992-1993
Title: Innovations of Heinz W Etzkorn
Introduction
Heinz W Etzkorn is a notable inventor based in Neu-Anspach, Germany. He has made significant contributions to the field of plasma coating technology. With a total of 2 patents, his work focuses on enhancing the quality and efficiency of coatings on dome-shaped substrates.
Latest Patents
One of his latest patents is a plasma CVD process for coating a dome-shaped substrate. This innovative process and apparatus are designed to coat strongly arched, dome-like substrates with a dielectric and/or metallic coating system on both the inside and outside faces. The technology allows for precise adjustment of the gas layer thickness above the substrate, ensuring that the homogeneous reaction occurring during the plasma phase does not compromise the desired coating quality. The result is a uniform coating that exhibits the highest optical quality, along with mechanical, thermal, and chemical stability, all achieved without complicated substrate movement. Additionally, specified axial and azimuthal coating thickness profiles can be superimposed by appropriately shaping the displacement body.
Career Highlights
Heinz W Etzkorn is associated with Schott Glaswerke, a company known for its expertise in glass and glass-ceramic products. His work at Schott has allowed him to develop and refine his innovative coating processes, contributing to advancements in the industry.
Collaborations
Heinz has collaborated with notable coworkers such as Harald Krummel and Volker Paquet. Their combined expertise has further enhanced the development of innovative solutions in the field of plasma coating technology.
Conclusion
Heinz W Etzkorn's contributions to plasma coating technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in coating dome-shaped substrates, paving the way for advancements in various applications.