Heinrich Gruenwald

Title: Heinrich Gruenwald: Innovator in Emission-Free Cleaning Technologies

Introduction

Heinrich Gruenwald is a notable inventor based in Gomaringen, Germany. He has made significant contributions to the field of precision optics cleaning and plasma etching processes. With a total of 2 patents, his work focuses on developing environmentally friendly technologies.

Latest Patents

Gruenwald's latest patents include a process for the emission-free cleaning of precision optics. This innovative method involves pretreating surfaces with surfactants, utilizing ultrasound exposure, and rinsing with buffered water. The process aims to degrade organic impurities into carbon dioxide using short-wave UV radiation or highly accelerated electrons. His second patent pertains to an apparatus for plasma etching, which features a process chamber, upper and lower electrodes, and a gas shower for delivering reactive gases. This apparatus is designed to enhance the efficiency of plasma etching while maintaining a controlled environment.

Career Highlights

Throughout his career, Gruenwald has worked with prominent companies such as Leybold Aktiengesellschaft and Leica Mikroskopie und Systeme GmbH. His experience in these organizations has allowed him to refine his expertise in precision optics and plasma technologies.

Collaborations

Heinrich Gruenwald has collaborated with notable colleagues, including Hans Ramisch and Anton Pawlakowitsch. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Heinrich Gruenwald's work in emission-free cleaning technologies and plasma etching processes showcases his commitment to innovation and environmental sustainability. His contributions continue to influence the field of precision optics.