Heidi J Hockel

Title: Innovations of Heidi J Hockel

Introduction

Heidi J Hockel is an accomplished inventor based in Orlando, FL (US). She has made significant contributions to the field of projection lithography, particularly in the area of micro-sculpting technologies. Her innovative work has led to the development of methods and systems that enhance the fabrication of micro-structures.

Latest Patents

Heidi J Hockel holds 1 patent for her invention titled "Micro-sculpting using phase masks for projection lithography." This patent describes methods and systems for creating a photo-mask that forms continuous relief micro-structures in photo-active material. The technology utilizes a basic amplitude mask or electron-beam to create a binary phase grating with pi-phase depth on a transparent reticle coated with photo-active material. The reticle serves as a phase mask for the fabrication of analog micro-elements, which can be used in image reduction machines such as optical steppers. The design, analysis, and fabrication procedures for this invention have been demonstrated for prisms and positive micro-lenses.

Career Highlights

Throughout her career, Heidi has focused on advancing the capabilities of micro-fabrication technologies. Her work has been instrumental in improving the precision and efficiency of creating micro-structures, which are essential in various applications, including optics and electronics.

Collaborations

Heidi has collaborated with notable professionals in her field, including Eric G Johnson and Mahesh Pitchumani. These collaborations have contributed to the successful development and implementation of her innovative technologies.

Conclusion

Heidi J Hockel's contributions to the field of micro-sculpting and projection lithography exemplify her dedication to innovation and excellence. Her patent and collaborative efforts continue to influence advancements in micro-fabrication technologies.