Company Filing History:
Years Active: 2017-2019
Title: Hee Sun Chae: Innovator in Plasma Technology
Introduction
Hee Sun Chae is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma technology, holding two patents that showcase his innovative approach to plasma generation and substrate treatment.
Latest Patents
His latest patents include a "Plasma generating apparatus using mutual inductive coupling and substrate treating apparatus comprising the same." This invention provides a plasma generating apparatus that utilizes an RF power supply to induce an electromagnetic field through multiple coils. The design aims to enhance the efficiency of plasma generation for various applications. Another patent, titled "Plasma generating device, method of controlling the same, and substrate processing device including the plasma generating device," describes a comprehensive system that includes a plasma chamber and electromagnetic inductors. This system allows for precise control of the power supplied to the inductors, optimizing the plasma generation process.
Career Highlights
Hee Sun Chae is currently employed at Psk Inc., where he continues to develop innovative technologies in plasma applications. His work has positioned him as a key figure in advancing plasma technology, contributing to both academic and industrial advancements.
Collaborations
He collaborates with talented coworkers, including Jeong Hee Cho and Jong Sik Lee, who contribute to the innovative environment at Psk Inc. Their combined expertise fosters a culture of creativity and technological advancement.
Conclusion
Hee Sun Chae's contributions to plasma technology through his patents and work at Psk Inc. highlight his role as an influential inventor in the field. His innovative solutions continue to pave the way for advancements in plasma applications.