Company Filing History:
Years Active: 2021-2022
Title: Haruyuki Ishii: Innovator in Focused Ion Beam Technology
Introduction
Haruyuki Ishii is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of focused ion beam technology. With a total of 2 patents, Ishii's work has advanced the capabilities of ion beam apparatuses, enhancing their precision and functionality.
Latest Patents
Ishii's latest patents include innovative designs for focused ion beam apparatuses. The first patent describes a focused ion beam apparatus that features an electron beam column, a focused ion beam column, a sample stage, and a coordinate acquisition unit. This unit is designed to acquire plane coordinates of designated irradiation positions on a sample. It also includes a movement amount calculation unit that determines how much the sample stage needs to be moved to achieve a eucentric height, ensuring that the electron beam and focused ion beam align correctly at each position.
The second patent also focuses on a focused ion beam apparatus, which includes a focused ion beam lens column, a sample table, and a sample stage. This apparatus is equipped with a memory that stores three-dimensional data related to the sample table and the irradiation axis of the focused ion beam. A display controller is included to visualize the positional relationship between the sample table and the irradiation axis when the sample stage is moved to a predetermined position.
Career Highlights
Haruyuki Ishii is currently employed at Hitachi High-Tech Science Corporation. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Atsushi Uemoto and Tatsuya Asahata. Their combined expertise contributes to the innovative projects at Hitachi High-Tech Science Corporation.
Conclusion
Haruyuki Ishii's contributions to focused ion beam technology exemplify his dedication to innovation in the field. His patents reflect a commitment to enhancing the precision and effectiveness of ion beam apparatuses.