Aichi, Japan

Haruki Kitamura


 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Haruki Kitamura: Innovator in Sewing Thread Technology

Introduction

Haruki Kitamura is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of textile technology, particularly in the development of sewing threads that enhance sewing efficiency.

Latest Patents

Kitamura holds a patent for a sewing thread and the process for producing it. This innovative sewing thread is designed to provide excellent high-speed sewability and automatic sewing characteristics. The thread consists of multiple under-twisted yarns that are equipped with upper-twist. Each yarn is composed of a sheath-core structure made from two or more multifilament yarns. Notably, part of the sheath-core structure yarn protrudes as loops on the yarn surface. These loops are structured to have 50 to 300 loops per meter with a length of 0.7 to less than 1.2 mm, and 10 or fewer loops per meter with a length of 1.2 mm or more. The yarns exhibit a strength of 4 to 6 CN/dtex, making them suitable for high-performance sewing applications. Kitamura has 1 patent to his name.

Career Highlights

Haruki Kitamura is associated with Toray Industries, Inc., a leading company in the textile and materials industry. His work focuses on enhancing the quality and performance of sewing threads, which are crucial for various applications in the textile sector.

Collaborations

Throughout his career, Kitamura has collaborated with esteemed colleagues such as Toshihiko Kimura and Kazuo Umeda. These collaborations have contributed to the advancement of innovative textile solutions.

Conclusion

Haruki Kitamura's contributions to sewing thread technology exemplify his commitment to innovation in the textile industry. His patented work continues to influence the efficiency of sewing processes, showcasing the importance of advancements in this field.

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