Haruhiro Harry Goto

Title: Haruhiro Harry Goto: Innovator in Plasma Processing Technology

Introduction

Haruhiro Harry Goto is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of plasma processing technology, holding two patents that showcase his innovative approach to engineering.

Latest Patents

Haruhiro Harry Goto's latest patents include a plasma processing apparatus designed to enhance the efficiency of plasma generation. The first patent describes a vacuum container that houses a pair of electrodes, which generate plasma through discharge. This apparatus features a shielding plate that separates the plasma processing region from the inner wall of the vacuum container while allowing communication between the two regions. Additionally, it incorporates a mechanism to create a pressure difference between these areas. The second patent outlines a similar plasma processing apparatus, which includes a first electrode connected to a plasma generating power source, a second electrode that supports a substrate for plasma treatment, and a third electrode that controls the potential within an evacuatable chamber.

Career Highlights

Haruhiro Harry Goto has worked with prominent companies such as Canon and Applied Materials Japan Inc. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to advancements in the field.

Collaborations

Throughout his career, Goto has collaborated with esteemed colleagues, including Nobuyuki Okamura and Atsushi Yamagami. These partnerships have fostered a creative environment that has led to innovative solutions in plasma processing.

Conclusion

Haruhiro Harry Goto's contributions to plasma processing technology through his patents and collaborations highlight his role as a significant inventor in this field. His work continues to influence advancements in plasma applications and processing techniques.