Company Filing History:
Years Active: 2014-2023
Title: **Haruhiko Doi: An Innovator in Silicon Oxide Polishing Technologies**
Introduction
Haruhiko Doi is a distinguished inventor based in Wakayama, Japan. With a total of five patents to his name, he has significantly contributed to the field of polishing technologies, particularly for silicon oxide films. His innovative approaches have advanced processes that are essential in various industries, including electronics and materials science.
Latest Patents
Among Doi's latest patents are two notable polishing liquid compositions aimed at optimizing the polishing process of silicon oxide films. The first patent is a polishing liquid composition that enhances the polishing rate of silicon oxide films. This composition includes cerium oxide particles, an additive with a specific reduction potential, and an aqueous medium, showcasing Doi's expertise in integrating chemical components for improved efficiency.
His second patent describes a polishing composition that combines water, cerium oxide particles, and a compound featuring both an amino group and acid groups. This creation is specifically designed to increase the speed of polishing operations, displaying Doi's continual focus on refining materials to elevate performance in technological applications.
Career Highlights
Throughout his career, Haruhiko Doi has been associated with Kao Corporation, a well-respected entity known for its innovation in consumer products and materials. At Kao, he has honed his skills and expanded his knowledge in the materials science sector, culminating in the patents that define his professional journey. His work emphasizes the importance of developing advanced materials that meet the growing demands of modern technology.
Collaborations
Doi collaborates with notable colleagues, including Norihito Yamaguchi and Takeshi Hamaguchi. Together, they contribute to innovative projects and research within Kao Corporation, further affirming the importance of teamwork in driving forward-thinking inventions and improvements in their field.
Conclusion
Haruhiko Doi’s contributions through his patents exemplify the impact of innovative thinking in the refinement of polishing technologies for silicon oxide films. His work not only responds to current industry needs but also lays the groundwork for future advancements. As he continues to develop new solutions, his influence within the scientific community and the industry at large is expected to grow.