Monroe, CT, United States of America

Harold W Adams


Average Co-Inventor Count = 1.1

ph-index = 4

Forward Citations = 33(Granted Patents)


Location History:

  • Newtown, CT (US) (1986)
  • Monroe, CT (US) (1990 - 1996)

Company Filing History:


Years Active: 1986-1996

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7 patents (USPTO):Explore Patents

Title: Harold W Adams: Innovator in Inorganic Substrate Stabilization

Introduction

Harold W Adams is a notable inventor based in Monroe, CT (US). He has made significant contributions to the field of materials science, particularly in the stabilization of inorganic substrates and the destruction of explosives. With a total of 7 patents to his name, Adams has demonstrated a commitment to innovation and safety in his work.

Latest Patents

Adams' latest patents include a process for stabilizing inorganic substrates. This process involves treating the substrate with sulfur at elevated temperatures, converting it into a solid, inert product that resists the leaching of metals and other inorganic ions. Another significant patent focuses on the destruction of explosives. This process stabilizes energetics, including explosives and obsolete munitions, below detonation temperature by reacting them with liquid sulfur. It also introduces sulfur into explosive packages without dismantling them, ensuring safety and efficiency.

Career Highlights

Throughout his career, Adams has worked with various companies, including Sultech, Inc. His innovative approaches have led to advancements in the stabilization of hazardous materials, showcasing his expertise in the field.

Collaborations

Adams has collaborated with notable individuals such as Albert Goldstein and James R Hendricks. These partnerships have contributed to the development of his groundbreaking patents and have enhanced the impact of his work.

Conclusion

Harold W Adams is a distinguished inventor whose work in stabilizing inorganic substrates and explosives has made a significant impact on safety and innovation. His contributions continue to influence the field and inspire future advancements.

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