Location History:
- Farmington Hills, MI (US) (2023)
- Novi, MI (US) (2024)
Company Filing History:
Years Active: 2023-2025
Title: Harish Bijwe: Innovator in Recliner Technology
Introduction
Harish Bijwe is a notable inventor based in Farmington Hills, MI (US). He has made significant contributions to the field of recliner technology, holding a total of 8 patents. His innovative designs focus on enhancing the functionality and reliability of recliner mechanisms.
Latest Patents
Among his latest patents is a locking assembly for recliners. This locking mechanism features a plate and a pawl, where the plate includes a peripheral lip with an interior face that defines multiple teeth. The pawl is designed with a central axis and includes several pawl teeth, including a first middle tooth and a second middle tooth. The first middle tooth is strategically positioned on one side of the central axis, featuring a flat face facing the axis and a curved face on the opposite side. Similarly, the second middle tooth is located on the opposing side, also with a flat face facing the axis and a curved face away from it. The pawl can be positioned in two states: one where it does not engage with the plate and another where it does engage, ensuring a secure locking mechanism for recliners.
Career Highlights
Harish Bijwe is currently employed at Camaco, a company known for its innovative solutions in the furniture industry. His work has significantly impacted the design and functionality of recliner assemblies, making them more user-friendly and reliable.
Collaborations
Throughout his career, Harish has collaborated with talented individuals such as Jeff Carroll and Sanjay Vakil. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Harish Bijwe's contributions to recliner technology exemplify his dedication to innovation and design. His patents reflect a deep understanding of mechanical systems and user needs, making him a valuable asset in the field.