Harald Strecker

Title: Innovations of Harald Strecker in Magnetron Sputtering Technology

Introduction

Harald Strecker is a notable inventor based in Munich, Germany. He has made significant contributions to the field of magnetron sputtering technology, particularly in the application of carbon layers. His innovative approach has led to the development of a unique method and apparatus that enhances the efficiency and effectiveness of sputtering processes.

Latest Patents

Strecker holds a patent for a "Magnetron sputtering method and apparatus utilizing a pulsed energy." This invention describes a procedure and apparatus for applying carbon layers using reactive magnetron sputtering. The process involves sputtering at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. During the pulse pattern period, all targets are switched on as an anode, ensuring that at least one target remains active at all times. Various embodiments of the invention include the detection and limitation of 'microarcs' and executing regeneration processes at predetermined time intervals.

Career Highlights

Strecker's career is marked by his association with the International Business Machines Corporation (IBM), where he has contributed to advancements in sputtering technology. His work has been instrumental in improving the quality and performance of carbon layer applications in various industries.

Collaborations

Throughout his career, Strecker has collaborated with notable colleagues such as Peter Frach and Klaus Goedicke. These collaborations have further enriched his research and development efforts in the field of magnetron sputtering.

Conclusion

Harald Strecker's innovative contributions to magnetron sputtering technology have paved the way for advancements in carbon layer applications. His patent reflects a significant step forward in the field, showcasing his expertise and commitment to innovation.