Hans Löschner

Title: The Innovative Contributions of Hans Löschner

Introduction

Hans Löschner is a notable inventor based in Vienna, Austria. He has made significant contributions to the field of microelectronics, particularly in the development of membrane masks used in ion projection lithography. With a total of 3 patents to his name, Löschner's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Löschner's latest patents include a "Large-area membrane mask and method for fabricating the mask." This invention aims to enhance the rigidity of a membrane mask by incorporating a second wafer made from the same material as the membrane layer. The second wafer is patterned to form a carrying ring and is fitted in a mirror-inverted manner to ensure that the membrane area is centered between the two carrying rings. Another significant patent is the "Method of producing large-area membrane masks," which provides inventive methods to avoid excessive mechanical strain on the membrane during production. This method ensures the integrity of the components, particularly when dealing with thin semiconductor layers.

Career Highlights

Throughout his career, Hans Löschner has worked with various organizations, including the Institut für Mikroelektronik Stuttgart. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in microelectronics.

Collaborations

Löschner has collaborated with notable colleagues such as Jörg Butschke and Florian Letzkus. These partnerships have fostered an environment of innovation and creativity, leading to the development of advanced technologies in the field.

Conclusion

Hans Löschner's contributions to the field of microelectronics through his patents and collaborations highlight his role as a significant inventor. His innovative approaches to membrane mask technology continue to influence the semiconductor industry.