Hans Dohse

Title: Innovations of Hans Dohse

Introduction

Hans Dohse is an accomplished inventor based in Sunnyvale, California. He has made significant contributions to the field of alignment systems, particularly in the context of material flows and optical lithography. With a total of three patents to his name, Dohse's work showcases his expertise and innovative thinking.

Latest Patents

Dohse's latest patents include an "Alignment system for various materials and material flows" and an "Alignment system for optical lithography." The first patent describes a method and system for aligning a tool to a workpiece in both continuous and discontinuous material flows. This system utilizes an imaging approach to capture images of the workpiece, allowing for the detection and tracking of microscopic features. By analyzing these features, the alignment to the workpiece can be controlled effectively.

The second patent focuses on an alignment system specifically designed for optical lithography. This system employs cameras fixed to a movable stage and a lithography unit to reference unique microscopic non-uniformities on the workpiece's surface. By establishing original position templates and utilizing template matching, the system can accurately determine the transformed coordinates of the workpiece, which is particularly useful for backside alignment in printed circuit board lithography.

Career Highlights

Throughout his career, Hans Dohse has worked with notable companies such as Maskless Lithography, Inc. and Chime Ball Technology Co., Ltd. His experience in these organizations has contributed to his development as an inventor and has allowed him to refine his innovative ideas.

Collaborations

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Conclusion

Hans Dohse's contributions to the field of alignment systems demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in material flows and optical lithography.