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Wiesbaden, Germany

Hans-Dieter Frommeld

This inventor holds 15 USPTO granted patents. Top assignees: Hoechst Aktiengesellschaft, Morton International, Inc.. Active years: 1979-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans-Dieter Frommeld. Retrieved from https://idiyas.com/inventor/hans-dieter-frommeld

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15

% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 6

Forward Citations = 120(Granted Patents)


Company Filing History:

goldMedal13 out of 6,705 
 
Hoechst Aktiengesellschaft
 patents
silverMedal2 out of 665 
 
Morton International, Inc.
 patents

Years Active: 1979-2000

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15 patents (USPTO):Explore Patents
1. 6127091 - Photopolymerizable composition and photopolymerizable recording material (2000-10-03),
2. 6114091 - Photopolymerizable composition containing an N-heterocyclic (2000-09-05),
3. 5221595 - Photopolymerizable mixture and recording material prepared therefrom (1993-06-22),
4. 5217845 - Photopolymerizable mixture and photopolymerizable copying material (1993-06-08),
5. 5200299 - Quinoline and acridine compounds effective as photoinitiators and (1993-04-06),
6. 5085669 - Process for stabilizing a leuco-dye solution by means of a piperidine (1992-02-04),
7. 5057398 - Photopolymerizable composition and photopolymerizable recording material (1991-10-15),
8. 4940647 - Photopolymerizable compositions a leuco dye and a leuco dye stabilizer (1990-07-10),
9. 4780393 - Photopolymerizable composition and photopolymerizable recording material (1988-10-25),
10. 4749639 - Photosensitive composition and recording material with photosensitive (1988-06-07),
11. 4737445 - Photopolymerizable composition and photopolymerizable recording material (1988-04-12),
12. 4659645 - Photosensitive mixture and photosensitive recording material with (1987-04-21),
13. 4457997 - Two-component diazotype material (1984-07-03),
14. 4273850 - Two-component diazotype material (1981-06-16),
15. 4171222 - Two-component diazotype material (1979-10-16),

Title: The Innovations of Hans-Dieter Frommeld

Introduction

Hans-Dieter Frommeld is a notable inventor based in Wiesbaden, Germany. He has made significant contributions to the field of photopolymerization, holding a total of 15 patents. His work has advanced the technology used in photoresist materials, which are essential in various applications, including electronics and printing.

Latest Patents

Among his latest patents are two key innovations: a photopolymerizable composition and a photopolymerizable recording material. The first patent describes a photopolymerizable composition that includes a polymeric binder, a compound that can be polymerized by free radicals, and a photoinitiator combination. This composition is highly photosensitive and produces photoresist stencils with vertical side walls. The second patent also focuses on a photopolymerizable composition containing an N-heterocyclic compound, which similarly results in highly photosensitive materials suitable for advanced applications.

Career Highlights

Throughout his career, Hans-Dieter Frommeld has worked with prominent companies such as Hoechst Aktiengesellschaft and Morton International, Inc. His experience in these organizations has allowed him to refine his expertise in photopolymerization and contribute to innovative solutions in the industry.

Collaborations

Hans-Dieter has collaborated with notable colleagues, including Hartmut Steppan and Hartmut Wiezer. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Hans-Dieter Frommeld's contributions to photopolymerization and his impressive portfolio of patents highlight his role as a significant innovator in the industry. His work continues to influence advancements in materials science and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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