Company Filing History:
Years Active: 1979-2000
Title: The Innovations of Hans-Dieter Frommeld
Introduction
Hans-Dieter Frommeld is a notable inventor based in Wiesbaden, Germany. He has made significant contributions to the field of photopolymerization, holding a total of 15 patents. His work has advanced the technology used in photoresist materials, which are essential in various applications, including electronics and printing.
Latest Patents
Among his latest patents are two key innovations: a photopolymerizable composition and a photopolymerizable recording material. The first patent describes a photopolymerizable composition that includes a polymeric binder, a compound that can be polymerized by free radicals, and a photoinitiator combination. This composition is highly photosensitive and produces photoresist stencils with vertical side walls. The second patent also focuses on a photopolymerizable composition containing an N-heterocyclic compound, which similarly results in highly photosensitive materials suitable for advanced applications.
Career Highlights
Throughout his career, Hans-Dieter Frommeld has worked with prominent companies such as Hoechst Aktiengesellschaft and Morton International, Inc. His experience in these organizations has allowed him to refine his expertise in photopolymerization and contribute to innovative solutions in the industry.
Collaborations
Hans-Dieter has collaborated with notable colleagues, including Hartmut Steppan and Hartmut Wiezer. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Hans-Dieter Frommeld's contributions to photopolymerization and his impressive portfolio of patents highlight his role as a significant innovator in the industry. His work continues to influence advancements in materials science and technology.