Company Filing History:
Years Active: 1988-1992
Title: Innovations by Hans A Protschka
Introduction
Hans A Protschka is an accomplished inventor based in Gaithersburg, MD (US). He has made significant contributions to the field of technology, particularly in the area of semiconductor fabrication. With a total of 2 patents, Protschka's work has had a notable impact on the industry.
Latest Patents
Protschka's latest patents include a method for fabricating high circuit density, self-aligned metal lines. This method involves creating patterned conductive lines that are self-aligned with underlying contact windows. The process begins with a layer of photosensitive material, such as photoresist, which is formed over a dielectric layer. The photoresist layer undergoes processing to develop areas corresponding to contact windows and patterned conductive lines. The dielectric layer is designed to reduce interlevel shorts, and selective etch steps are employed to aid in the formation of the conductive line and contact window structure.
Another significant patent is the photoresist process for reactive ion etching of metal patterns. This process utilizes a release agent solution applied to a polysilicon layer, allowing for improved control over back reflected and diffracted light during the optical exposure step. The presence of a dye in the release agent enhances the uniform exposure of the photoresist, ensuring high-quality results.
Career Highlights
Hans A Protschka is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in technology. His expertise in semiconductor fabrication has positioned him as a valuable asset to his team and the company.
Collaborations
Throughout his career, Protschka has collaborated with notable colleagues, including Harish N Kotecha and Dave Stanasolovich. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.
Conclusion
Hans A Protschka's contributions to the field of technology through his patents and work at IBM highlight his role as a significant inventor. His innovative methods in semiconductor fabrication continue to influence the industry and pave the way for future advancements.