Hana Hwang

Title: Innovations of Inventor Hana Hwang

Introduction

Hana Hwang is a prominent inventor based in College Park, MD (US). She has made significant contributions to the field of photolithography, showcasing her expertise through her innovative patent.

Latest Patents

Hana Hwang holds a patent titled "Method and system for photolithographic fabrication with resolution far below the diffraction limit." This invention provides a method and system for photolithography that includes a photoresist comprising a photoinitiator and a prepolymer resin. The system features a first light source that generates a beam of light focused on a specific area of the photoresist to excite the photoinitiator. Additionally, a second light source generates another beam of light that temporarily deactivates the excited photoinitiator. The overlapping areas of light and the precise timing of their application allow for advanced photolithographic techniques. She has 1 patent to her name.

Career Highlights

Hana Hwang is affiliated with the University of Maryland at College Park, where she continues to advance her research and innovations in photolithography. Her work has garnered attention for its potential applications in various technological fields.

Collaborations

Hana has collaborated with notable colleagues, including John T Fourkas and Erez H Gershgoren, contributing to a dynamic research environment that fosters innovation.

Conclusion

Hana Hwang's contributions to photolithography exemplify her role as a leading inventor in her field. Her innovative methods and systems continue to push the boundaries of technology and research.