Kyunggi-do, South Korea

Han-Ki Kim


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations of Han-Ki Kim in Chemical Vapor Deposition Technology.

Introduction

Han-Ki Kim is a notable inventor based in Kyunggi-do, South Korea. He has made significant contributions to the field of chemical vapor deposition technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency and effectiveness of deposition methods.

Latest Patents

Han-Ki Kim holds a patent for a "Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same." This invention involves a catalyst-enhanced chemical vapor deposition (CECVD) apparatus designed to apply tension to a catalyst wire. This tension prevents the catalyst wire from sagging due to thermal deformation. Additionally, the apparatus utilizes extra gas to prevent the generation of foreign materials during the deposition process. The CECVD apparatus includes a process chamber, a showerhead for introducing process gas, a tensile catalyst wire structure, and a substrate for gas deposition. This innovative design addresses issues of non-uniform temperatures and film growth, while also enhancing the durability of the catalyst wire.

Career Highlights

Han-Ki Kim is currently employed at Samsung Mobile Display Co., Ltd. His work at this leading company has allowed him to focus on advancing technologies in the display industry. His contributions have been instrumental in improving the quality and performance of display materials.

Collaborations

Han-Ki Kim has collaborated with notable colleagues, including Hee-Cheol Kang and Kazuo Furuno. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Han-Ki Kim's work in chemical vapor deposition technology exemplifies the spirit of innovation. His patented apparatus not only addresses critical challenges in the field but also enhances the overall efficiency of deposition methods. His contributions continue to impact the industry positively.

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