Knoxville, TN, United States of America

Halsey H Haselton


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 253(Granted Patents)


Company Filing History:


Years Active: 1984-1994

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Halsey H. Haselton

Introduction

Halsey H. Haselton, an accomplished inventor based in Knoxville, TN, has made significant strides in the field of plasma technology. With two patents to his name, his work focuses on advancements that enhance the efficiency and effectiveness of plasma generation and energy recovery systems.

Latest Patents

Haselton's latest patents showcase his ingenuity in developing cutting-edge technology. His first patent, titled "Coupled Microwave ECR and Radio-Frequency Plasma Source for Plasma," describes a dual plasma device with a microwave discharge operating at electron cyclotron resonance (ECR). This innovative system generates uniform plasma over an extensive area of approximately 1000 cm² at low pressures below 0.1 mtorr. The ECR microwave plasma effectively initiates a secondary radio-frequency (RF) plasma, creating an environment rich in charged particles that enhances performance.

His second patent, "Neutral Beamline with Improved Ion Energy Recovery," presents a generator that improves the energy recovery of the full energy ion component of the beam exiting the neutralizer cell. By utilizing a magnetic field to deflect unneutralized full energy ions from the beam path, Haselton's design allows for enhanced efficiency, ensuring that fractional energy ions do not detract from the overall energy recovery process.

Career Highlights

Halsey Haselton's career includes notable experiences with several prestigious organizations. He has contributed to innovative projects at Martin Marietta Energy Systems, Inc. and The United States of America, as represented by the United States. His expertise in plasma technology has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Haselton has collaborated with talented individuals, including his coworkers Chin-Chi Tsai and William K. Dagenhart. Working alongside such esteemed colleagues has further enhanced his contributions to the advancement of plasma technologies.

Conclusion

Halsey H. Haselton's contributions to the fields of plasma technology and energy recovery stand as a testament to his innovative spirit and commitment to scientific advancement. His two patents reflect a dedication to creating more efficient systems, paving the way for future innovations in the industry.

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