Company Filing History:
Years Active: 2000-2002
Title: Hak-pil Kim: Innovator in Plasma Process Technology
Introduction
Hak-pil Kim is a notable inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of plasma process technology, holding 2 patents that enhance the efficiency and effectiveness of plasma chambers.
Latest Patents
His latest patents include a "Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning." This innovative apparatus features a plasma chamber equipped with in situ monitoring capabilities. The design includes a sampling manifold that induces the flow of sample gas from the plasma chamber for analysis. A gas analyzer is utilized to assess the sample gas flowing through the manifold. The in situ monitoring method establishes background levels by monitoring an initial gas and may involve baking the apparatus to minimize contaminants. Following this, the method monitors a process reaction and, after unloading a wafer and discharging waste gas, it observes an in situ cleaning reaction. The cleaning method employs a mixture of sulfur hexafluoride and chlorine to effectively clean the plasma chamber after etching a polysilicon layer.
Career Highlights
Hak-pil Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma processing equipment.
Collaborations
He collaborates with talented coworkers, including Sung-bum Cho and Eun-Hee Shin, who contribute to the development of cutting-edge technologies in their field.
Conclusion
Hak-pil Kim's contributions to plasma process technology exemplify the impact of innovative thinking in the electronics industry. His patents reflect a commitment to improving manufacturing processes and enhancing product quality.