Kyoto, Japan

Hajime Akiyama


Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 65(Granted Patents)


Location History:

  • Otsu, JP (1992)
  • Kyoto, JP (2002)

Company Filing History:


Years Active: 1992-2002

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Hajime Akiyama: Innovator in Polyurethane Technology

Introduction

Hajime Akiyama is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of polyurethane technology, holding a total of 2 patents. His work focuses on the development of innovative materials that have various applications in industry.

Latest Patents

Akiyama's latest patents include a process for producing polyurethane foam and a foam forming composition. The polyurethane foam is created by reacting an addition-polymerizable active hydrogen component with an organic polyisocyanate. This process results in a foam that exhibits excellent hardness and dimensional stability, making it suitable for use as a heat insulator, shock-absorbing material, and synthetic wood. Additionally, he has developed coating compositions that improve the resistance of metal surfaces to chipping, utilizing blocked urethane prepolymers and various curatives.

Career Highlights

Hajime Akiyama is currently employed at Sanyo Chemical Industries, Ltd., where he continues to innovate in the field of polymer chemistry. His work has not only advanced the understanding of polyurethane materials but has also led to practical applications that benefit various industries.

Collaborations

Throughout his career, Akiyama has collaborated with esteemed colleagues such as Motonao Kaku and Yasushi Kumagai. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Hajime Akiyama's contributions to polyurethane technology exemplify the impact of innovative thinking in material science. His patents reflect a commitment to advancing the field and providing solutions that meet industry needs.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…